Abstract : Monocrystalline silicon is widely used in the field of photoelectric systems, and it is easy to cause its thermal damage and change of performance under the action of laser. For the urgent needs of high-precision laser weapons and laser fine processing industry, the thermal damage of monocrystalline silicon irradiated by pulse train of millisecond laser andthe relationship among the laser energy density, number of pulses and other important parameters of thermal damage were analyzed, and the dam